http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202003612-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2019-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_299e81f5a72b392abdb219280feebbf3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87b99267f268944f21d923986e01fb50 |
| publicationDate | 2020-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202003612-A |
| titleOfInvention | Novolac type phenol resin, its manufacturing method, photosensitive composition, photoresist material and photoresist film |
| abstract | The object of the present invention is to provide a novolac-type phenol resin, which can be suitably used as a photoresist material having excellent sensitivity, excellent resolution, and excellent heat resistance; its manufacturing method, and photosensitive composition containing the resin , Photoresist materials and photoresist films. Specifically, it provides a novolak type phenol resin characterized by a condensate of an aromatic compound and an aliphatic aldehyde represented by the following formula (1); a method for producing the same, and a photosensitive resin containing the same Sexual composition, photoresist material, and photoresist film as its hardened film.n n n n n n n n n n (R 1 , R 2 , and R 4 are any of a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group, and a halogen atom, and R 3 and R are a hydrogen atom, a hydrocarbon group, and one or Any one of the structural parts of a plurality of alkoxy groups, halogen atoms, and hydroxyl groups, m, n, and p are 0 or an integer of 1 to 4). |
| priorityDate | 2018-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 325.