| abstract |
An object of the present invention is to provide a chemically amplified positive photosensitive resin capable of forming a resist pattern excellent in cross-sectional perpendicularity of a non-resist portion even when a resist pattern is formed on a metal surface A method for producing a composition, a mold-attached substrate using the composition, and a plated article. The composition of the present invention, which is a technical means for solving the problem, contains an acid generator, a resin, and a sulfur-containing compound. The sulfur-containing compound includes a sulfur-containing compound (C1) represented by at least one of formulas (c1-1) and (c1-2), and a thiol compound (C2) different from the sulfur-containing compound (C1). In the formula, the ring A system ring constitutes a single ring having 4 or more atoms and 8 or less, X system -CR 1c R 2c -, -NR 3c -, =CR 4c -, =N- etc., R 1c ~R 4c system Hydrogen atoms, organic groups, etc. The compound of formula (c1-1) has one thiol group in the molecule and no hydroxyl group. The compound of formula (c1-2) has no mercapto group and hydroxyl group in the molecule. |