| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8205ec6ee1cd95eb60a03826535bad97 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G12-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G12-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2019-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0091a724fa227fdc0c7296ba62ecb26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c814a45f0098a6ff66a810610ba359f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e52d0ea38c7ea92eb22cc5e23b72ce30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1583171c96e69dd71dd78a7275efc5d1 |
| publicationDate |
2019-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201945417-A |
| titleOfInvention |
Underlayer film-forming composition comprising a phenol resin containing a triaryldiamine and an aromatic vinyl compound added |
| abstract |
The invention provides a photoresist composition or a dissimilar resist underlayer film which is difficult to mix during lamination. By improving the thermal reflow property of a polymer, a resist underlayer with improved pattern filling properties during firing is formed. membrane. A resist underlayer film-forming composition containing a phenolic resin, which is an aromatic compound (A) containing an aromatic ring having at least two amine groups and three carbon atoms having 6 to 40 carbon atoms as described below The aromatic ring is a structural group (C) formed by a reaction with the vinyl group of the aromatic vinyl compound (B). The aforementioned structural group (C) has the following formula (1): [In the formula (1), R 1 is a divalent group containing at least two amine groups and at least three aromatic rings having 6 to 40 carbon atoms]. The aforementioned R 1 represents a divalent organic group in which two hydrogen atoms are removed from the aromatic ring of the compound represented by the following formula (2). The aforementioned R 1 represents a divalent organic group obtained by removing two hydrogen atoms from the aromatic ring of N, N′-diphenyl-1,4-phenylenediamine. . |
| priorityDate |
2018-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |