| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2019-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0e1593761c544a8274665ce3db30573
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa2cab4e82472bc943e4be0283ccc273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbf7f2561e66e4c479ede49c7b3d56f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_926b08cd2f1681877250ba029f56b2fb |
| publicationDate |
2019-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201943694-A |
| titleOfInvention |
Photoacid generator, chemically amplified photoresist material, and pattern forming method |
| abstract |
The subject of the present invention is to provide a photoacid generator used in a chemically amplified photoresist material. The chemically amplified photoresist material is used in photolithography using high-energy rays such as ArF excimer laser, EB, EUV as exposure light. The balance of sensitivity and LWR is excellent, and a rectangular pattern is formed; and a chemically amplified photoresist material containing the photoacid generator and a pattern forming method using the photoresist material are provided. A photoacid generator is composed of a compound represented by the following formula (1a). |
| priorityDate |
2018-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |