http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201941349-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec83ea8e6721b1a5654b038fdb9b223f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67155 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67167 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-77 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677 |
| filingDate | 2018-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32a9e90d01eefb0395895333e5fb7cc3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99ab2362453947dad1d158513521bf19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef3e13e6cf888bc6c9896530958b1f7b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f269d7d5c79be0dd4961ed71761b6684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47b3d8a817bf547c3a8bdcd9cd79bf05 |
| publicationDate | 2019-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201941349-A |
| titleOfInvention | Substrate processing device |
| abstract | The substrate processing apparatus of the present invention includes: a substrate holding unit that holds the substrate horizontally; a processing liquid supply unit having a processing liquid nozzle that ejects the processing liquid to supply the processing liquid to the upper surface of the substrate; and a moving unit that causes the foregoing The processing liquid supply unit moves between a processing position where the processing liquid nozzle faces the upper surface of the substrate, and a retreat position where the processing liquid nozzle retracts from a position facing the upper surface of the substrate; and the processing liquid supply The unit further includes a first flow path formed at the processing liquid nozzle, and in a state where the processing liquid supply unit is located at the processing position, one end portion faces the central region of the substrate, and the other end portion faces the center of the substrate. Opposite the peripheral area; a second flow path which is folded back and extended from the one end portion of the first flow path, and supplies a treatment liquid to the one end portion of the first flow path; and a plurality of ejection ports, which are formed in the foregoing The processing liquid nozzles are arranged along the direction in which the first flow path extends, and sprays the processing liquid in the first flow path toward the upper surface of the substrate. |
| priorityDate | 2017-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.