| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F11-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2019-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e65759a794f26829715254c0c6b6989b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_501bb994cd7121f96e4a2a952ba7d09c |
| publicationDate |
2019-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201940648-A |
| titleOfInvention |
Slurry for chemical mechanical polishing of cobalt-containing substrates |
| abstract |
Methods and compositions for chemical mechanical polishing (CMP) cobalt-containing substrates are provided herein. The methods and compositions of this application involve the use of a complexing agent, an oxidizing agent, an abrasive, and a cobalt corrosion inhibitor comprising an amino acid having at least two acidic moieties. The method and composition of the present application can be used to achieve a high cobalt removal rate during the CMP process while effectively inhibiting corrosion. |
| priorityDate |
2018-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |