| abstract |
The object of the present invention is to remove polyvalent metals and polyvalent metal ions from a composition in which a material to be purified is dissolved or dispersed by a metal adsorbent combined with a specific chelate resin, instead of one type of chelating resin. Or its charged metal oxide colloidal particles to obtain a highly purified purified material composition. The solution of the present invention is a metal adsorbent, which is a metal adsorbent for removing metal impurities in a solution containing a chelating agent (A) and a chelating agent (B). The chelating agent (A) contains a type containing reduced glucosamine. Functional group carrier metal adsorbent, chelating agent (B) contains thiol group, thiourea group, amine group, triazabicyclodecene derivative group, thiourenium group, imidazole group, sulfonic acid group, hydroxyl group , Aminoacetic acid group, amidoxime group, amino phosphate group or a combination of metal adsorbents of the carrier. The carrier of the chelating agent (A) and the chelating agent (B) is silica, a substance containing a silica component, polystyrene, or a cross-linked porous polystyrene. The aforementioned solution is a solution containing water or an organic solvent. |