http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201932588-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1d29f7ac2c7f9be9f7dae1a83bbb5c92
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D17-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D17-0008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02087
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0209
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
filingDate 2019-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8505e4b1993e25183870f36c1ee27cb6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1031beaa6aa1de01e08265efee848b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_329005bfd234d28c972c80eb89689e59
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_207902c49bcb07a75b1726e3582f0280
publicationDate 2019-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201932588-A
titleOfInvention Semiconductor wafer processing solution containing hypochlorite ions
abstract An object of the present invention is to provide a treatment liquid and a cleaning method for removing tantalum and tungsten adhering to an end surface portion, a back surface portion, and the like of a semiconductor wafer. The solution of the present invention is a treatment liquid for cleaning a semiconductor wafer, which contains (A) hypochlorous acid ions and (C) a solvent, and has a pH of more than 7 and less than 12.0 at 25 °C. A method of cleaning a semiconductor wafer is provided by removing the germanium and tungsten from the semiconductor wafer by contacting the processing liquid with a semiconductor wafer having germanium or tungsten.
priorityDate 2018-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577457
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62021
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6380
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID39329
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558793
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453530413
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559554
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526858
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415057377
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524205
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID468172510
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414004986
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448749742
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526493
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23992
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25289
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23950
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449477149
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456988458
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID18699355
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61437
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61739
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24948
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23956
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6197
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524263
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24341
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9833922
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454535207
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23700086
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23964
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526332
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24504
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID39329
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420183231
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449217605
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID22759671
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425762086
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16028
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID416641266
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID923

Total number of triples: 70.