http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201930382-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4854 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-6685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-6674 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-66 |
| filingDate | 2018-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ec3705567bb227f707ebb54bcb45ac9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1283a500f7d87c7e5bec7d184a43948f |
| publicationDate | 2019-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201930382-A |
| titleOfInvention | Urethane resin composition for polishing pad and polishing pad |
| abstract | The present invention provides a polishing pad having a high polishing rate and capable of obtaining an object to be polished with high flatness (less rounded edges). The present invention uses a polishing pad which is a cured product of a urethane resin composition containing a main agent (i) containing a urethane prepolymer (A) and a hardener (ii). The prepolymer (A) is a reaction of a composition containing a polyol component (a) containing a polyol (a1) having a molecular weight of 300 or more and a short-chain diol (a2) having a molecular weight of less than 300 and a polyisocyanate (b). The resultant product has an isocyanate group at the terminal, the polyol component (a) contains polytetramethylene glycol of 40% by mass or more and 90% by mass or less, and short-chain diol (a2) of 1% by mass or more, The hardened material has a peak of tan δ in a range of 120 ° C or higher and 200 ° C or lower, and a peak of tan δ in the range of 120 ° C or higher and 200 ° C or lower is 0.18 or higher. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I807213-B |
| priorityDate | 2017-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 129.