| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de498babb0c04a00ceb653738877b147 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D487-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D403-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D401-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F9-572 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D413-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D403-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D401-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D209-42 |
| filingDate |
2018-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_542e1a2d6e8acafd6a87b51f2d207cfa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a155c93669bf649e177c724c3cffd245 |
| publicationDate |
2019-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201930290-A |
| titleOfInvention |
Compound, latent base generator, photosensitive resin composition containing the same, and cured product |
| abstract |
It is an object of the present invention to provide a novel compound which exhibits sufficient absorption for long-wavelength ultraviolet rays (especially 365 nm), a satisfactory sensitivity (base generating ability), a latent base generator containing the compound, A photosensitive resin composition containing the compound as a polymerization initiator and a cured product thereof. The present invention provides a compound represented by the following formula (I). Furthermore, the present invention provides a latent base generator containing the compound, a polymerization initiator containing the compound, a photosensitive resin composition containing the polymerization initiator (A) and the photosensitive resin (B), and Hardened material and its method of manufacture. (The definition of the symbol in the formula refers to the specification) |
| priorityDate |
2017-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |