| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C63-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C233-92 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2018-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b66c56ecf806d54b7598f9507555ed2b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2755db4cf58164bd00e91fcc1d759dcc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ee0e7ae3c8a0a5115e1d805c445c1a6 |
| publicationDate |
2019-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201928518-A |
| titleOfInvention |
Photosensitive ray- or radiation-sensitive resin composition, resist film, pattern forming method, method for producing electronic device, compound |
| abstract |
The present invention provides a photoresistive or radiation-sensitive resin composition capable of obtaining a pattern having excellent storage stability and excellent LWR performance. The present invention also provides a resist film, a pattern forming method, a method for producing an electronic device, and a compound related to the photosensitized or radiation-sensitive resin composition. The actinic radiation- or radiation-sensitive resin composition includes a resin having a repeating unit having a group which is decomposed by the action of an acid and has an increased polarity, and a compound Q represented by the general formula (I). |
| priorityDate |
2017-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |