http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201928112-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1250408cc4b78ebc7bf07a2a42fd31f4 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42 |
| filingDate | 2017-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da7b5c15ca68541f8ded515d07a06141 |
| publicationDate | 2019-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201928112-A |
| titleOfInvention | Fluorine-containing thermal chemical vapor deposition method and object |
| abstract | The thermal chemical vapor deposition process is disclosed. In particular, a thermally chemical vapor deposited article comprises a substrate and an oleophobic treatment of one of the substrates, the oleophobic treatment having oxygen, carbon, helium, fluorine, and hydrogen. This oleophobic treatment has a treatment thickness of less than 600 nm and a non-uniform wetting state. The thermal chemical vapor deposition method comprises placing an object in a thermal chemical vapor deposition chamber, thermally reacting dimethyl decane to form a layer, oxidizing the layer to form an oxidized layer, and oxidizing the layer. The fluoro-functionalization results in a chemical vapor deposition of oxidized and then fluoro-functionalized dimethyl decane. The oxidized and then fluoro-functionalized dimethyl decane chemical vapor deposition process has a treated thickness of less than 600 nm and a non-uniform wetting state. |
| priorityDate | 2017-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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