| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2379-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2203-16 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1014
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1333
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1067
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133305
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333 |
| filingDate |
2018-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ef80d3c99fd7b1b8629cee068b7a0cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ac5312d82e4be40de7b6b92bc4872b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_998f6ddbaaf869b18f9cfaa03f5cf3cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ccfcaf87b37f88ab14d3f36fe01dc93 |
| publicationDate |
2019-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201925269-A |
| titleOfInvention |
Polyimine film for flexible display substrate and flexible display substrate thereof |
| abstract |
The invention relates to a polyimide film with a low stress change rate on a silicon wafer. In the process of depositing an inorganic film on a polyimide substrate in a high temperature process, The cracks caused by the stress change of the amine substrate are minimized, so that the reduction of the electrical characteristics of the flexible display such as the restoration of the afterimage and the decrease of the current can be reduced. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I775294-B |
| priorityDate |
2017-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |