| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_00d1ab86970161b516a8aa89aa1b0446 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B9-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00 |
| filingDate |
2018-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85a30feb0bbf4f8cc78423f72d61d666
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88ae1d22485725c2eca42f4b5380e5c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ccdf9fda4aeb7f0914f2139fde00396 |
| publicationDate |
2019-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201924791-A |
| titleOfInvention |
Chamber environment recovery method and etching method |
| abstract |
The invention provides a chamber environment restoration method, comprising: an oxidation step, oxidizing particles in the chamber, and extracting oxidation products in the chamber after a predetermined time has elapsed; a protective film forming step in the chamber A protective film is formed on the wall. The invention also provides an etching method, the chamber environment restoration method and the etching method, which can not only solve the particle pollution, but also ensure the productivity and the etching rate of the subsequent etching process. |
| priorityDate |
2017-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |