http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201923817-A

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filingDate 2018-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf014b8845cbb7480df904347f952588
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publicationDate 2019-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201923817-A
titleOfInvention Plasma processing method
abstract The invention provides a plasma processing method for homogenizing plasma density distribution when performing plasma processing. The plasma processing method of one embodiment is implemented in a state where the workpiece is contained in the internal space of the chamber body. The plasma processing method includes the following steps: (i) performing the first plasma processing on the processed object; and (ii) performing the second plasma processing on the processed object. The power of the second radio frequency signal set in the step of performing the second plasma processing is larger than the power of the second radio frequency signal set in the step of performing the first plasma processing. In the step of performing the second plasma treatment, a magnetic field distribution is formed by the electromagnet, and the magnetic field distribution has a horizontal component larger than the horizontal component on the center of the object on the edge side of the object.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11699571-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I790736-B
priorityDate 2017-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 44.