http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201922825-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1333 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2018-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf8460c55ae1312b53b8e08284750b8c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eeb660a6603ff794731a1e51a1812083 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b07c67cb7b7cca5f270c2aaa7af8b56c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ac48cc5df725441bfe3f97120a63af5 |
| publicationDate | 2019-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201922825-A |
| titleOfInvention | Method for manufacturing high-definition pattern and method for manufacturing display element using same |
| abstract | An object of the present invention is to provide a method for efficiently manufacturing a photoresist pattern below an analysis limit, which is suitable for use in the field of manufacturing liquid crystal display elements. Specifically, the present invention provides a person who maintains or improves the shape of a pattern having a tapered shape, and which is a high-definition pattern below the limit analysis.n n n The solution is a method for manufacturing a high-definition pattern, which comprises the following steps: coating a photoresist composition made of a novolac resin having an alkali dissolution rate of 100 to 3000Å on a substrate, and making the photoresist composition layer The step of forming; the step of exposing the photoresist composition layer; the step of developing the photoresist composition layer to form a photoresist pattern; the step of heating the photoresist pattern; the photoresist pattern The entire surface exposure step; the step of applying a fine pattern forming composition to the surface of the photoresist pattern to form a fine pattern forming composition layer; heating the photoresist pattern and the fine pattern forming composition layer to heat the fine pattern A step of hardening a region near the photoresist pattern forming the composition layer to form an insoluble layer; and a step of removing a non-hardened portion of the fine pattern forming composition layer to form a fine pattern; and a step of heating the fine pattern . |
| priorityDate | 2017-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 115.