Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f96aa5fb688ac46af62a9c8bbdc3e970 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-02809 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0256 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0255 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-2697 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0426 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-036 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01M3-3236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01F15-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N35-00 |
filingDate |
2018-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_722fc4eabd3a371eb59292b6e34e1209 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2de9ddd0d8e8a6ac13f184b7eb66a1d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36257feb41a135ad98d3b2418e6dc037 |
publicationDate |
2019-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201920907-A |
titleOfInvention |
Quartz crystal microbalance sensor for manufacturing process monitoring and related methods |
abstract |
A monitoring device for monitoring a production process in a production system is provided. The monitored production system includes a processing room and multiple flow components. A quartz crystal microbalance (QCM) sensor monitors one flow component of multiple flow components of the production system and is configured to be exposed to process chemicals in one flow component during the production process. The controller measures the resonance frequency shift of the QCM sensor caused by the interaction between the QCM sensor and the process chemicals in a flow assembly during the manufacturing process. The controller determines the parameters of the manufacturing process in the processing room based on the measured resonance frequency shift of the QCM sensor in a flow component. |
priorityDate |
2017-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |