http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201917777-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02129 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02307 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2254 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2256 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-225 |
filingDate | 2018-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_066221b5b0427e8cb3d87d1fabf21e69 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a029f73be78d355478603a67427c5a0 |
publicationDate | 2019-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201917777-A |
titleOfInvention | Diffusion agent composition and method of manufacturing semiconductor substrate |
abstract | An object of the present invention is to provide a diffusing agent composition capable of efficiently forming a thin film capable of diffusing an impurity diffusing component into a semiconductor substrate at a higher concentration than in the past (for example, by a single film formation), and provide a use thereof. A method for manufacturing a semiconductor substrate using the diffusing agent composition. Means for Solving the Problems The diffusing agent composition of the present invention is a diffusing agent composition for diffusing impurities in a semiconductor substrate, and is characterized in that: contains an impurity diffusion component (A) and a silane coupling agent (B), and the aforementioned silane The coupling agent (B) has a group and an alkyl group capable of generating a silanol group by hydrolysis, and at least one of the aforementioned alkyl groups is in the chain and / or the terminal has a member selected from the group consisting of a primary amine group, a secondary amine group, and a tertiary An amine group of at least one of the group formed by the amine group. |
priorityDate | 2017-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 288.