| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F230-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-33 |
| filingDate |
2018-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb507140c4e2ef5bc203bbf1b2fbf449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cd8f21b5f09799dfd4f270b065717e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b61abe184b6197353dc2702be63fab4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_355fe90b9f92d0f0e168769500943923 |
| publicationDate |
2019-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201915037-A |
| titleOfInvention |
Radiation-sensitive linear resin composition, semiconductor element, display device, cured film, and method of manufacturing the same |
| abstract |
The present invention provides a radiation sensitive resin composition, a semiconductor device, a display device, a cured film, and a method for producing the same, which can cope with radiation sensitivity and so-called PCD margin and PED margin characteristics. A radiation sensitive resin composition comprising: a polymer component (A) having a structure containing an aromatic ring and an alkoxyalkyl group directly bonded to the aromatic ring in the same or different polymer a unit (I) and a structural unit (II) having an acidic group (excluding structural units derived from an aromatic unsaturated carboxylic acid and a hydroxyfluorinated alkyl group-containing monomer); a radiation sensitive compound (B); Organic solvent (G). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I774993-B |
| priorityDate |
2017-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |