| abstract |
The present invention provides a sensitizing ray or radiation sensitive resin composition capable of forming a pattern with excellent LER performance and also capable of suppressing pattern collapse. In addition, there is provided a resist film, a pattern forming method, and a method for manufacturing an electronic component using the above-mentioned sensitized radiation or radiation-sensitive resin composition. The sensitized radiation-sensitive or radiation-sensitive resin composition includes a resin having a group represented by the general formula (1), and a compound that generates an acid by irradiation with actinic rays or radiation. |