| abstract |
The present invention provides a photosensitive composition, a pattern forming method using the photosensitive composition, a cured product of the photosensitive composition, a photosensitive adhesive containing the photosensitive composition, and a blanket using the photosensitive composition. The method for adhering a substrate. The photosensitive composition of the present invention has good light transmittance and sensitivity to exposure. When exposed to light, it can form a hardened material that is sufficiently hardened. When exposed through a half-tone mask, not only A sufficient height difference can be made between the full-tone exposure section and the half-tone exposure section in the formed pattern, and a sufficient height can be ensured for the half-tone exposure section. In the present invention, as the photopolymerization initiator (A), two or more types having a peak in a wavelength region of 320 nm or more and less than 400 nm in the absorption spectrum are used, and the maximum wavelength of the peak is different from each other. An oxime ester compound, and a compound that exhibits an absorption coefficient of 10 or more at any wavelength in a wavelength range of 400 nm or more is not used. |