abstract |
An ultrasonic device system configured to perform high-intensity focusing ultrasonic (HIFU) is described. An ultrasonic device may include a HIFU unit configured to emit high acoustic wave intensity. The plurality of ultrasonic devices may be disposed on a substrate, and the substrate may be configured to be bent, so that the emission directions of the ultrasonic devices may be controlled mechanically. Additionally or alternatively, ultrasonic beams generated by different ultrasonic devices can be electronically directed by adjusting the phase of the signal used by each element of a device to be driven. For example, multiple phase arrays of an ultrasonic device can be used to focus ultrasonic energy to a desired location. In some embodiments, the time at which different ultrasonic signals are transmitted can be controlled, for example, to ensure that the combined signal system has at least one desired intensity. |