| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate |
2013-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f060e09853ee4cc9c0f49968ed0d876
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c52a7040d42c8e111d2f22c0d35828af
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d04be56a9d142d17374c31321a508079
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd17809b57459b01873da3a1c9cc660a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d234124be7e513dda348c4f8808368e |
| publicationDate |
2019-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201903899-A |
| titleOfInvention |
Method for patterning a low dielectric constant dielectric film |
| abstract |
The present invention relates to a method of patterning a low-k dielectric film. In one example, a method of patterning a low-k dielectric film includes forming and patterning a mask layer on a low-k dielectric layer, the low-k dielectric layer being disposed on a substrate. The method also includes treating the exposed portion of the modified low-k dielectric layer with a nitrogen-free plasma. The method also includes removing the modified portion of the low-k dielectric layer by remote plasma treatment, and removing the modified portion of the low-k dielectric layer relative to the mask layer and the low dielectric constant The unmodified portion of the electrical layer is selective. |
| priorityDate |
2012-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |