| abstract |
The present invention provides a cleaning method, a cleaning device, a memory medium, and a cleaning composition capable of effectively removing a processed layer by decomposing or denaturing the processed layer at a higher temperature than in the past.加热 In a state where the substrate provided with the layer to be processed is heated, the substrate is supplied with the vapor of the component (A) which can decompose the layer to be processed, and then the layer to be processed which reacts with the component (A) is removed from the substrate. The component (A) is preferably nitric acid or sulfonic acid. The sulfonic acid is preferably a fluorinated alkylsulfonic acid. |