| abstract |
The invention relates to a gas-gel deposition coating method for plasma-resistant coating, and more specifically, in the plasma etching, the interior of the equipment is protected in a plasma environment, so that the roughness of the metal base material coating layer is lowered. , reducing the occurrence of particles and increasing the adhesion of the coating layer to the metal base material. A gas-gel deposition coating method for plasma-resistant coatings related thereto. |