abstract |
The present invention provides a novel metal triamine compound, a preparation method thereof, a composition for depositing a metal-containing film containing the same, and a method for preparing a metal-containing film using the same, and the metal triamine compound of the present invention has excellent reactivity, It is thermally stable, has high volatility, and has high storage stability, and therefore, it can be used as a metal-containing precursor to easily prepare a high-purity metal-containing film having a high density. |