http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201838011-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec83ea8e6721b1a5654b038fdb9b223f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67167 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67276 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2018-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_238fb6da2e847ee015b76164b3415336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1868fe65ccb25c9825f06d00c6179221 |
| publicationDate | 2018-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201838011-A |
| titleOfInvention | Substrate processing apparatus and substrate processing method |
| abstract | The substrate processing apparatus of the present invention includes: a substrate holding unit that holds the substrate; and a processing liquid circulation member that uses an inner wall surface to partition at least a processing liquid flow path that communicates with a discharge port that discharges the processing liquid to the substrate held by the substrate holding unit. One part; a processing liquid supply unit that supplies a processing liquid having a higher temperature than normal temperature to the processing liquid flow path; and a temperature changing unit that is used to heat or cool the outer wall surface of the processing liquid circulation member from the outside to make the above A temperature change occurs in the processing liquid circulation member; and a control device that executes a substrate processing step and an equilibrium temperature maintaining step. The substrate processing step controls the processing liquid supply unit to supply the processing liquid flow path with a higher temperature than normal temperature. The processing liquid is sprayed with the high-temperature processing liquid from the discharge port to perform processing on the substrate held by the substrate holding unit. The equilibrium temperature maintaining step is not to supply processing to the processing liquid flow path from the processing liquid supply unit. Control the temperature change unit in the liquid state The circulation member of the inner wall surface of the treatment solution is maintained at the thermal equilibrium temperature. |
| priorityDate | 2017-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449266279 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15913 |
Total number of triples: 27.