| abstract |
The present invention provides a photosensitive radiation- or radiation-sensitive resin composition, and a photosensitive radiation- or radiation-sensitive film using the photosensitive radiation or radiation-sensitive resin composition, a method for forming a pattern, and a method for manufacturing an electronic device. In the actinic radiation- or radiation-sensitive resin composition of the present invention, when the exposure latitude is set to EL and the aerial image intensity logarithmic slope is set to NILS, the relationship expressed by a specific formula is satisfied, and in particular, ultrafine formation is achieved. Patterns such as contact hole patterns with a diameter of 45 nm or less, and line and space patterns with a line width of 45 nm or less can form those with excellent roughness, exposure latitude, and focus margin. |