| abstract |
The present invention provides an aqueous chemical mechanical planarization (CMP) polishing composition with excellent heat aging and storage stability in the form of a concentrate including a mixture of the following two: a compound containing two quaternary ammonium groups, such as Butyl C 1 -C 8 alkanediammonium dihydroxide or its salt, preferably N, N, N, N ', N', N'-hexabutyl-1,4-butanediammonium dihydroxide (HBBAH); and based on the total weight of the composition, in an amount of 1 wt.% To 30 wt.% Or preferably 15 wt.% To 22 wt.% In solid form containing amino silane groups Silicon dioxide particles, the pH of the composition is in the range of 3 to 5 or preferably 3.5 to 4.5, wherein after heat aging at 45 ° C for at least 6 days, the composition is stable to visible precipitation or sedimentation, The solids content is 15 wt.%. |