| abstract |
A method of depositing an oxide film is provided herein. An oxide film can be deposited comprising selectively depositing an oxide film on a first surface of the substrate relative to a second, different surface of the same substrate. For example, an oxide film such as an insulating metal oxide film can be selectively deposited on the first surface of the substrate with respect to a second, different surface of the same substrate. The second, different surface can be an organic passivation layer. |