| abstract |
The present invention provides a mask cleaning liquid composition, comprising a fluorene-based compound represented by the following Chemical Formula 1. In the following Chemical Formula 1, R1 and R2 are each independently methyl or ethyl, and R3 is hydrogen. Or C1 ~ C4 alkoxy substituted or unsubstituted C1 ~ C4 saturated or unsaturated hydrocarbon group, wherein when R1 and R2 are methyl, R3 is substituted or unsubstituted by C1 ~ C4 alkoxy C2 ~ C4 saturated hydrocarbon group or C2 ~ C4 unsaturated hydrocarbon group. The mask cleaning liquid composition of the present invention has the advantages of exhibiting good cleaning power even when it does not contain environmentally controlled substances such as NMP, and is easy to process. |