| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2017-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_beb62a7f52dc2a00054baf6baa8ff77a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ef466fc3607e925bf3e57161456513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2755db4cf58164bd00e91fcc1d759dcc |
| publicationDate |
2018-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201831539-A |
| titleOfInvention |
Pattern forming method, sensitizing ray or radiation sensitive resin composition, sensitizing ray or radiation sensitive film, and method of manufacturing electronic component |
| abstract |
The present invention provides a pattern forming method such as LWR and a pattern excellent in EL, a sensitizing ray-sensitive or radiation-sensitive resin composition, a sensitizing ray-sensitive or radiation-sensitive film, and a method for producing an electronic device. The pattern forming method has a process 1 of forming a film using a sensitizing ray-sensitive or radiation-sensitive resin composition containing an acid group and decomposing and generating by an action of an acid An acid-based acid-decomposable group of the resin A, a photoacid generator B, a basic compound C, and a compound D which decomposes and generates an acid by the action of light or an acid produced by the photoacid generator B; Process 2, Exposing the film; in Process 3, developing the exposed film by using a developing solution containing an organic solvent, the basic compound C having a basicity capable of neutralizing the acid group of the resin A The acid produced by the above compound D has a weak acidity than the acid produced by the above photoacid generator B. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I717197-B |
| priorityDate |
2016-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |