| abstract |
The present invention provides an etching composition used for etching of a transition metal film used as an electrode or the like of a TFT-LCD display. The etching composition according to the present invention can not only effectively chelate the metal ions generated when the transition metal film is etched, but also stably maintain a significantly increased number of processed sheets for a long period of time, and effectively suppress the self-decomposition reaction of the composition, thereby In the use or storage, excellent stability in which the number of etching treatment sheets is not lowered is also shown. |