Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_78c81eee3745be3f24f94e9de1686991 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1014 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-16 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2017-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f40d69c9d80aa0cdd130d49cd1323ba2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17e7720467aa9d542cc7712da246252e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e980de56ab4c70d2b219e9c71f43e4a |
publicationDate |
2018-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201829552-A |
titleOfInvention |
Polyester phthalic acid and photosensitive composition containing the same |
abstract |
The present invention relates to a polyester amidine (A) which is a constituent component of a photosensitive composition having excellent resolvability and residual film rate. The polyester amidinic acid (A) is characterized in that it contains X mol tetracarboxylic dianhydride and Y mol in a ratio that makes the relationship of the following formula (1), formula (2), and formula (3) hold. A diamine, a polyhydric hydroxy compound of Moore, and a cationic polymerizable cyclic ether compound having a polymerizable double bond of Moore. 0.2 ≦ Z / Y ≦ 8.0 (1) 0.2 ≦ (Y + Z) /X≦5.0 (2) 0.05 ≦ W / 2X ≦ 1.0 ········ (3) |
priorityDate |
2016-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |