| abstract |
The series of cobalt compounds described herein, a process for the production of cobalt compounds, and a composition including a cobalt metal film precursor for depositing a cobalt-containing film (eg, cobalt, cobalt oxide, cobalt nitride, etc.). Examples of cobalt precursor compounds are (alkynyl) dicobalt hexacarbonyl compounds, cobaltenamine compounds, cobalt monoazadiene compounds, and (functionalized alkyl) cobalt tetracarbonyl compounds. Examples of surfaces used to deposit metal-containing films include, but are not limited to, metals, metal oxides, metal nitrides, and metal silicides. Functional coordination systems with functional groups such as amines, nitriles, imines, hydroxyls, aldehydes, esters, halogens, and carboxylic groups for selective deposition on certain surfaces and / or superior films Properties such as uniformity, continuity, and low resistance. |