Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a8a9982b1666c54b5bf02d6c944891e4 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-10378 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49124 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0097 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-0306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2103-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2103-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2101-40 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B17-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-481 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-362 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0622 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B7-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0097 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-0306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-486 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-0025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-49827 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-49822 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-498 |
filingDate |
2017-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c35a91ff8d1e0fe4c09a719505ff3c2f |
publicationDate |
2018-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201822282-A |
titleOfInvention |
Low surface roughness substrate with through holes and manufacturing method thereof |
abstract |
A method of forming a via in a substrate includes etching a damaged region that extends through a thickness of a stack of a plurality of substrates that are removably bonded together. Each of the substrates in the stack has at least one surface removably bonded to a surface of another substrate in the stack, wherein each substrate has at least one surface having a surface roughness (Ra) less than or equal to about 0.6 when the substrates in the stack are debonded Nm. |
priorityDate |
2016-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |