| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-26 |
| filingDate |
2017-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0e7846e4317e9e5ae53b6ed7d055ce3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b51c1f89ad4c44b50f0f86b342b0196f |
| publicationDate |
2018-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201821486-A |
| titleOfInvention |
Inversion pattern forming composition, inversion pattern forming method, and element forming method |
| abstract |
An object of the present invention is to provide an inverted pattern formation composition that uses an aqueous solvent that has little effect on the resist pattern, has good flatness or fillability after coating, and has excellent etching resistance. In addition, methods for forming patterns using the same are also provided. The solution to the problem is a reverse pattern formation composition, which contains: a polysiloxane compound containing a repeating unit having a nitrogen-containing group, and a solvent containing water; and a fine pattern formation method using the same. |
| priorityDate |
2016-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |