| abstract |
An object of the present invention is to provide a novel photoresist underlayer film-forming composition.n n n The solution is to include the following formula (1a) and / or formula (1b): n n n [In the formulae (1a) and (1b), two R 1 represent independent alkyl groups, alkenyl groups, aromatic hydrocarbon groups, halogen atoms, nitro or amine groups, and two R 2 represent independent hydrogen atoms, Alkyl, alkenyl, acetal, fluorenyl, or glycidyl, R 3 represents an aromatic hydrocarbon or heterocyclic group which may have a substituent, R 4 represents a hydrogen atom, phenyl, or naphthyl, and 2 k represents Each independently 0 or 1, m represents an integer from 3 to 500, p represents an integer from 3 to 500, and X represents a benzene ring, and the two -C (CH 3 ) 2 -groups bonded to the benzene ring are meta or The relationship of counterpoint]n n n The photoresist underlayer film-forming composition of the polymer and solvent of the repeating structural unit shown. |