| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-1452 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L39-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L29-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-261
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L31-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-28 |
| filingDate |
2017-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c758a69dc981cfd6bad766ccac2df9d2 |
| publicationDate |
2018-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201814034-A |
| titleOfInvention |
Surface treatment composition |
| abstract |
The present invention provides a surface treatment composition capable of performing a treatment on the surface of an abrasive object to be polished by sufficiently removing defects on the surface of the abrasive object to be polished containing silicon-silicon bonds and nitrogen-silicon bonds.n n n The surface treatment composition of the present invention is used for the surface treatment of a polishing object containing silicon-silicon bonds and nitrogen-silicon bonds, and has a pH of less than 9.0, and contains: composed of only carbon atoms, or composed of carbon atoms A non-ionic water-soluble polymer (A) in a main chain formed with a nitrogen atom; and an anionic water-soluble polymer (B) having a main chain and a side chain; and the main chain system is composed of only carbon atoms; the side chain The system is bonded to the main chain composed of only carbon atoms, and has a sulfonic acid group or a salt thereof, or a carboxyl group or a salt thereof. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111748284-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11702570-B2 |
| priorityDate |
2016-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |