| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0606c8e113c860d8a6c41e2aaaf3120d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-55 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-022 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C323-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D251-32 |
| filingDate |
2016-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ac065c818068652a814fdab2f43753b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18f47657288576cd97fe9241f67013cb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa4ec1c6c1e91d61e84eaa7ede114a9c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8bf556f742d0245f7212870ba3db0877 |
| publicationDate |
2018-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201812445-A |
| titleOfInvention |
Chemically amplified positive photosensitive resin composition, method for producing substrate with mold, and method for producing electroplated molded body |
| abstract |
The present invention provides a chemically amplified positive photosensitive resin composition excellent in sensitivity and rectangularity, a method for producing a substrate with a mold, and a method for producing a plated molded article. The chemically amplified positive photosensitive resin composition contains a resin (A), a photoacid generator (C), a solvent (D), and a thiol compound which are obtained by copolymerization of a monomer mixture and which contains an acid dissociable protecting group. E), and anthraquinones (F). The thiol compound (E) has a structure represented by the formula (E-1). Formula (E-1) |
| priorityDate |
2016-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |