| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate |
2017-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_beb62a7f52dc2a00054baf6baa8ff77a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a0acc6b510ca764de19434633b49404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2755db4cf58164bd00e91fcc1d759dcc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1 |
| publicationDate |
2018-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201809883-A |
| titleOfInvention |
Method for forming negative resist pattern and method for manufacturing electronic component |
| abstract |
The invention provides a negative resist pattern forming method with a larger exposure latitude and less film loss, and an electronic component manufacturing method including the negative resist pattern forming method. The negative resist pattern forming method includes the following processes: a film formation process, which uses a photosensitive radiation- or radiation-sensitive resin composition to form a film on a substrate; an exposure process, which irradiates the film with actinic rays or radiation; and a development process, Using a developer containing an organic solvent to develop a film irradiated with actinic radiation or radiation, the photosensitive radiation- or radiation-sensitive resin composition contains at least one derived from the following general formulae (1) to (3) Resin of a repeating unit of any one of the compounds represented by). |
| priorityDate |
2016-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |