| abstract |
The invention includes an exposure chamber configured to contain a passivation gas having a selected hydrogen concentration, the exposure chamber further configured to contain at least one non-linear optical (NLO) of the passivation gas for exposure to the chamber. A crystal; a source of passivation gas, which is fluidly connected to the exposure chamber, the source of passivation gas is configured to supply a passivation gas to an internal portion of the exposure chamber; and a substrate configured to hold the NLO crystal Inside the chamber, the substrate is further configured to maintain a temperature of one of the NLO crystals at or near a selected temperature, the selected temperature being lower than a melting temperature of one of the NLO crystals. |