| abstract |
Provided is a composition for forming a film containing a polysilazane, which is formed by, for example, forming a dry film on the surface of the polysilazane composition in a state where there is little conversion to a silicon dioxide substance. The secondary processing is used to form the silicon dioxide film based on the two-stage conversion process to form a dense and dense silicon dioxide film.nn n n A polysilazane-containing film-forming composition containing a specific amine compound, polysilazane, and a solvent, and a silicon dioxide that is coated on a substrate and converted into a silicon dioxide substance Method of material formation. The specific amine compound has two amine groups, and the amine group has at least one phenyl-substituted hydrocarbon group. |