| abstract |
The subject of the present invention is to provide a negative photosensitive composition and a pattern forming method using the negative photosensitive composition. The negative photosensitive composition can be developed in a low-concentration alkali developing solution, can be cured at low temperature, and can obtain transparency and chemical resistance. Hardened film with high environmental and environmental resistance.nn n n The solution is a negative photosensitive composition, which is characterized by: (I) an alkali-soluble resin, which is a polymer including a carboxyl group-containing polymer unit and an alkoxysilyl group-containing polymer unit, and (II) a polymer Siloxane, (III) compounds containing two or more (meth) acrylic fluorenyloxy groups, (IV) (i) polysiloxane derivatives having a specific structure, and / or (ii) two or more epoxy Compounds, (V) a polymerization initiator, and (VI) a solvent. |