http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201805400-A

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filingDate 2017-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d260ed63bd0a6c4d87a14284b3075d3
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publicationDate 2018-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201805400-A
titleOfInvention Abrasive grain, method for producing the same, polishing slurry containing the same, and polishing method using the same
abstract The abrasive grains of the present invention include abrasive grains having inorganic abrasive particles whose surface is coated with an additive and whose pH is 8 or less and whose zeta potential is positive. The additive is preferably picolinic acid or glutamic acid. The inorganic abrasive particles are preferably cerium oxide particles. Abrasive particles containing cerium oxide particles whose surface is coated with picolinic acid or glutamic acid and having a pH value of 8 or less and a positive zeta potential are obtained by a step of wet pulverizing cerium oxide in the presence of picolinic acid or glutamic acid Abrasive particles produced by a method for producing abrasive particles.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020391343-A1
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