| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b55c349b43c3ecba4977fd52cc8f8c67 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-542
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-547
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3464
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-544
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-548
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2017-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_049c3e11a57da174f01ab05a55feac8b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3572875c4a3e35de3d2e3e8747df9f9f |
| publicationDate |
2018-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201802275-A |
| titleOfInvention |
Optical film manufacturing method |
| abstract |
The present invention is a preliminary film for the production of an optical film for forming a multilayer optical film on a film substrate, and a film of two or more different materials is formed on the film substrate by simultaneously energizing a plurality of sputtering chambers. The laminated body is used to calculate the film thickness of a plurality of thin films based on optical characteristics obtained by an optical measurement unit (80) provided in a sputtering apparatus. The measurement of the film thickness and the adjustment of the film formation conditions of the thin film are repeated until the optical characteristics obtained by the optical measurement section or the film thicknesses of the plurality of thin films calculated from the optical characteristics fall within a specific range. |
| priorityDate |
2016-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |