http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201800859-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2017-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2813f5d89b84f6e61fe0b9d32971f945 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9192c399533d31f9ea695746491a06bb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f77eba0c5db6899eaaf8c2c569ca8e6f |
| publicationDate | 2018-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201800859-A |
| titleOfInvention | Pattern forming method and radiation sensitive resin composition |
| abstract | The present invention provides a pattern forming method that reduces the number of lithographic steps and can form a fine pattern. The pattern forming method of the present invention includes a step of forming a first coating film having liquid repellency and being lyophilized by irradiation energy on a substrate; a step of removing an insulating layer in a first region on the substrate; The step of forming a concave pattern in the second region in at least a part of the region other than the first region on the substrate; and the step of removing the insulating layer in the first region includes irradiating energy of a specific wavelength and making the first region of the first region The step of removing the first coating film in the first region by contacting the specific chemical solution with the first coating film, and forming the concave pattern in the second region includes irradiating the energy of a specific wavelength to make the surface of the insulating layer in the second region affinity. Liquefaction steps. |
| priorityDate | 2016-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 210.