| abstract |
The present invention provides a radiation-sensitive composition which can form a pattern having excellent infrared shielding properties and excellent in squareness. Further, the present invention provides an optical filter, a laminate, a pattern forming method, a solid-state imaging device, an image display device, and an infrared sensor. The radiation sensitive composition comprises a near infrared ray absorbing agent, a resin, a radical polymerizable compound, and a photoradical polymerization initiator, and has a maximum absorption wavelength in a range of 700 nm to 1000 nm, and a maximum absorption wavelength. The ratio of the absorbance Amax to the absorbance A550 at a wavelength of 550 nm, that is, the absorbance Amax/absorbance A550 is 50 to 500, the resin contains a resin having an acid group, and the mass ratio of the radically polymerizable compound to the resin having an acid group is radical polymerization. Compound / resin having an acid group = 0.3 to 0.7. |