| abstract |
The present invention provides a radiation-sensitive resin composition, a cured film, a pattern forming method, a solid-state imaging device, and an image display device which are excellent in sensitivity and excellent in temporal stability of sensitivity. The radiation sensitive resin composition of the present invention comprises: a resin, a polymerizable compound having an ethylenically unsaturated bond, a photopolymerization initiator, an organic solvent, and water; and the photopolymerization initiator contains a group selected from branched alkyl groups and The oxime ester compound of at least one of the cyclic alkyl groups has a water content of 0.1% by mass to 2% by mass based on the mass of the radiation sensitive resin composition. |