| abstract |
An object of the present invention is to provide a treatment liquid having corrosion resistance to a metal film disposed on a substrate, and removal of an organic film on the substrate or dry etching residue adhered to the substrate and dry ashing The residue is excellent in removability. The treatment liquid of the present invention contains water, a hydrophilic organic solvent, a quaternary ammonium salt, and an inorganic anion, and the content of the inorganic anion is from 0.001 mass to 1 mass ppm with respect to the total mass of the treatment liquid. |